ESegNet-ILT: An end-to-end mask optimization method in VLSI design flow based on enhanced SegNet

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Hui Xu, Yong Xue, Yu Zhang, Xia Sun, Jiale Li, Ruijun Ma, Huaguo Liang, Zhengfeng Huang

Published: 2025, Last Modified: 12 Jan 2026Integr. 2025EveryoneRevisionsBibTeXCC BY-SA 4.0