Concurrent Steiner Tree Selection for Global routing with EUVL Flare Reduction

Sudipta Paul, Tridib Mukherjee, Pritha Banerjee, Susmita Sur-Kolay

Abstract: Highlights•Flare is a phenomenon in Extreme Ultra-violet lithography, which causes layout distortions.•In order to reduce flare, it is required to distribute the layout features conforming to the global flare distribution which can be modelled as a 2D concave function. In addition to that, it is important to take care of the delay during redistribution of the layout features.•For global routing, a set of delay optimized Steiner trees are to be constructed for each of the nets.•The Steiner tree that might lead to the best possible wire distribution for minimizing flare has to be selected for each net.•We have proposed a method based on mathematical programming that can select concurrently a delay-aware Steiner tree for each net such that flare over the layout area can be minimized. We have validated our proposed approach on IBM benchmark circuits to show the effectiveness of delay-aware flare reduction at the global routing stage.