Deriving optimal atomic layer deposition process conditions using machine learning

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Jangwon Seo, Hyo-Seok Hwang, Sunyoung Park, Seungmin Lee, Dae Sin Kim, Sun-Taek Lim, Junhee Seok

Published: 01 Sept 2025, Last Modified: 04 Nov 2025Journal of Industrial Information IntegrationEveryoneRevisionsCC BY-SA 4.0
Abstract: Highlights•Introduced the ALD-GPR model combining MLP and GPR to predict partial pressure.•Achieved RMSE 0.0074 and 18x faster speed, proving ALD-GPR as a CFD alternative.•Developed metrics to assess uniformity and derive optimal ALD process conditions.•Provided a data-driven framework to enhance ALD process efficiency and uniformity.