Abstract: 180 Kbit magnetoresistive random access memory (MRAM) designed for embedding in a 0.28 micron CMOS process has been developed. The memory cell is based on a 1-transistor 1-magnetic tunnel junction (1T1MTJ) bit cell. The architecture, write driver, and sense amplifier are described. The use of a test register to characterize and optimize the memory design is also discussed.
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