A Predictive Maintenance System for Silicon Epitaxial Deposition

Gian Antonio Susto, Alessandro Beghi, Cristina De Luca

Abstract: Silicon Epitaxial Deposition is a process strongly influenced by wafer temperature behavior, that has to be constantly monitored to avoid the production of defective wafers. A Predictive Maintenance (PdM) System is here proposed with the aim of predicting process behavior and scheduling control actions in advance. Two different prediction techniques have been employed and compared: the Kalman predictor and the Particle Filter with Gaussian Kernel Density Estimator. The accuracy of the PdM module has been tested on real fab data. The proposed approach is flexible and can handle the presence of different recipes on the same equipment.